Low energy ion scattering spectroscopy using the CMA type AES apparatus AAS-200.

Low-energy ion beamline scattering apparatus for surface science investigations

We report on the design, construction, and performance of a high current monolayers/ s , mass-filtered ion beamline system for surface scattering studies using inert and reactive species at collision energies below 1500 eV. The system combines a high-density inductively coupled plasma ion source, high-voltage floating beam transport line with magnet mass-filter and neutral stripping, decelerato...

Note: low energy inverse photoemission spectroscopy apparatus.

An apparatus for the low-energy inverse photoemission spectroscopy is described. In this technique, low energy electron having kinetic energy below 4 eV is incident to the sample and detect the emitted photons in the near ultraviolet range (below 5 eV, longer than 250 nm) to investigate the unoccupied states of the solid materials. Compared with the prototype apparatus reported previously [H. Y...

Characterization of Alloy Electrocatalysts by Combined Low-Energy Ion Scattering Spectroscopy and Electrochemistry

A fuel cell can be thought of as a cold-combustion power source that generates electrical energy directly from (stored) chemical energy. Due to minimal heat transfers, it is unfettered by conversion-efficiency limitations characteristic of hot-combustion devices. Unlike batteries, but similar to internal combustion engines, a fuel cell is a continuous-flow system in which fuel and oxidant are e...

LOW-ENERGY-ION ENHANCED DIFFUSION AT THE SURFACE OF METALS

Radiation enhanced diffusion at the surface of metals has been observed and studied for low-energy nitrogen ions at the surface of copper. The displacement of the target atoms during irradiation creates vacancies and other defects near the surface, thus enhancing the diffusion of implanted materials toward the surface and also into the solid. The mechanism has been studied here by a specia...

Damage formation and annealing studies of low energy ion implants in silicon using medium energy ion scattering